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光栅是一种应用非常广泛的光学元件。通过优化结构尺寸的方法可以获得同样材料光栅的不同辐射特性。本文以一维微结构金属电介质光栅为例,以8~12μm作为目标波段,通过严格耦合波分析与遗传算法相结合的方法对单组金属电介质光栅和双组金属电介质光栅的结构尺寸和光学常数进行双重优化,找到了硅作为电介质材料时的最优结构尺寸和该结构尺寸下电介质材料的最优光学常数。通过该方法,可以用来调控所有目标波段下的辐射特性,为进一步提高一维微结构光栅辐射特性提供了新的途径。
Grating is a very widely used optical element. Different radiation characteristics of the same material grating can be obtained by optimizing the dimensions of the structure. In this paper, a one-dimensional microstructured metal dielectric grating is taken as an example, the target wavelength band is 8 ~ 12μm, the structure and optical constants of single-group metal-dielectric grating and double-group metal-dielectric grating are combined by the method of rigorous coupling wave analysis and genetic algorithm Double optimization was performed to find the optimal structure size of silicon as the dielectric material and the optimal optical constants of the dielectric material for the structure size. The method can be used to adjust the radiation characteristics of all the target bands, which provides a new way to further improve the radiation characteristics of the one-dimensional micro-structured grating.