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采用磁控溅射方法在Si基板上镀制了横向梯度分布的Mo/Si周期多层膜。以X射线掠入射反射测量了横向梯度多层膜的膜系结构,在基板65mm长度范围内,多层膜周期从8.21nm线性减小到6.57nm,周期梯度为0.03nm/mm。国家同步辐射实验室反射率计的反射率测试结果表明:该横向梯度分布周期多层膜上不同位置,能反射在13.3～15.9nm波段范围内不同波长的极紫外光,反射率为60%～65%。
The Mo / Si multilayer films with lateral gradient distribution were prepared by magnetron sputtering on Si substrate. The film structure of transverse gradient multilayer was measured by X-ray grazing incidence reflection. The periodicity of the multilayer films decreased linearly from 8.21 nm to 6.57 nm and the periodic gradient was 0.03 nm / mm over the length of 65 mm. The results of reflectivity measurements of the national synchrotron radiation reflectometer show that the transverse gradient distribution can reflect EUV at different wavelengths in the range of 13.3-15.9 nm at different positions on the multilayer film with the reflectivity of 60% 65%.