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用溅射技术制作了γ-Fe_2O_3磁膜,并通过透射电子显微镜观察了磁膜的电子显微像和选区电子衍射环,由电子衍射环进行了磁膜的晶体结构分析,讨论了多晶磁膜的生长条件。
The γ-Fe 2 O 3 magnetic film was prepared by sputtering technique. The electron microscopy and the selected electron diffraction ring of the magnetic film were observed by transmission electron microscopy. The crystal structure of the magnetic film was analyzed by the electron diffraction ring. Film growth conditions.