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加速器离子源环境中的K本底是影响AMS测量40K灵敏度的关键因素。实验采用高纯Cu(99.9999%,K含量低于8×10-9)对HI-13串列加速器离子源中的K本底进行了初步调查。在实验中,离子源靶锥由高纯Cu直接制成。靶锥表面经过1h的离子源Cs束溅射后,在加速器低能端和AMS终端分别测量63Cu的
The K background in the accelerator ion source environment is a key factor that affects AMS’s sensitivity to 40K measurements. Experiments using high purity Cu (99.9999%, K content of less than 8 × 10-9) HI-13 tandem accelerator ion source K background was initially investigated. In the experiment, the ion source target cone is made directly from high purity Cu. After 1 h of ion source Cs beam sputtering on the surface of the target cone, 63 Cu