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电子束直接作图技术曾因可靠性差、销路不好,美国的瓦里安公司、GCA公司和Veeco公司都中止了开发工作。然而,日本却在电子束直接作图技术方面越干越起劲,除研究开发电子束直接作图技术应用于ISI图形制造外,还广泛地研究开发这一技术的新用场。最近,日本三菱电机开发了用电子束直接作图技术制作印刷电路基板图形的全新方式的装置,并认为电子束直接作图将可能成为像液晶显示那样大面积薄膜功能器件
E-beam direct mapping technology was due to poor reliability, poor sales, the United States Varian, GCA and Veeco companies have suspended the development work. However, Japan is more and more energetic in direct electron beam mapping technology. In addition to researching and developing electron beam direct mapping technology used in ISI graphic manufacturing, it is also widely used in research and development of this technology. Recently, Mitsubishi Electric of Japan has developed a new method of making a pattern of a printed circuit board by electron beam direct mapping technology, and believes that direct mapping of an electron beam may become a large-area thin film functional device such as a liquid crystal display