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Pure ZnO and Si-doped ZnO thin films were deposited on quartz substrate by using sol-gel spin coating process. X-ray diffraction analysis shows that all the thin films have hexagonal wurtzite structure and preferred c-axis orientation. Si-doped ZnO films show room temperature ferromagnetism (RTFM) and reach the maximum saturation magnetization value of 1.54 kAm-1 at 3% Siconcentration. RTFM of Si-doped ZnO decreases with the increasing annealing temperature because of the formation of SiO 2 . Photoluminescence measurements suggest that the RTFM in Si-doped ZnO can be attributed to the defect complex related to zinc vacancies V Zn and oxygen interstitials Oi .
Pure ZnO and Si-doped ZnO thin films were deposited on quartz substrates by using sol-gel spin coating process. X-ray diffraction analysis shows that all the thin films have hexagonal wurtzite structure and preferred c-axis orientation. Si-doped ZnO films RTFM of Si-doped ZnO decreases with increasing temperature because of the formation of SiO 2. Photoluminescence measurements suggest that the RTFM (RTFM) and reach the maximum saturation magnetization value of 1.54 kAm -1 at 3% Siconcentration. in Si-doped ZnO can be attributed to the defect complex related to zinc vacancies V Zn and oxygen interstitials Oi.