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该文叙述了对准装置的三维计算机模拟技术和一些范例的计算。这项技术的开发为未来ＶＬＳＩ技术的发展，找到了对准和套刻精度问题的答案。分析的根据是通用的有限元电磁波传播码ＥＭＦＩｅｘ，它严格地模拟三维对准标记光的散射。Ｎｉｋｏｎ激光步进机对准（ＬＳＡ）装置作为模拟仪器，模拟了套刻误差和信号形状，研究了理想化的不对称金属标记的情况，表明严密模拟的初步结果，与以前所用的一维菲涅耳近似法有着实质性区别。
This article describes the three-dimensional computer simulation of alignment devices and some examples of calculations. The development of this technology for the future development of VLSI technology, found the alignment and overlay accuracy of the answer. The analysis is based on the common EMF EMFIex finite element code, which closely simulates the scattering of 3D alignment marks. The Nikon Laser Stepper Alignment (LSA) device was used as an analogue instrument to simulate the overlay error and signal shape. The idealized asymmetric metal marking was investigated. The preliminary results of rigorous simulation showed that, compared with the previous one-dimensional There is a substantial difference between the Niels approximation method.