论文部分内容阅读
采用磁控溅射法,用纯MoS2/W双靶在模具钢Cr12和硅基片上溅射MoS2/W复合纳米薄膜,通过X射线衍射仪、能谱仪、扫描电子显微镜对薄膜的成分和结构进行分析。采用UMT-2型微摩擦磨损试验机在大气(相对湿度30%～45%)和室温(20～25℃)环境下评价薄膜的摩擦磨损性能。结果表明:MoS2/W复合薄膜组织致密,主要生长晶向为(002)晶向,摩擦因数低,摩擦学性能优于纯MoS2膜,且耐磨寿命高、摩擦稳定性好、承载能力大。
The composition and structure of the films were analyzed by X-ray diffractometer, energy dispersive spectrometer and scanning electron microscopy using the magnetron sputtering method to sputter MoS2 / W composite thin film on Cr12 and Si substrate with pure MoS2 / W double target Analyze. The friction and wear properties of the films were evaluated using a UMT-2 micro-friction and wear tester in the atmosphere (relative humidity 30% ~ 45%) and room temperature (20 ~ 25 ℃). The results show that the MoS2 / W composite film has a dense microstructure with a (002) crystal orientation and low friction coefficient. The MoS2 / W composite film has better tribological properties than pure MoS2 film.