The Characterization of Nanoparticles Element Oxide Slurries Used in Chemical-Mechanical Planarizati

来源 :6th Asia-Pacific Winter Conference on Plasma Spectrochemistr | 被引量 : 0次 | 上传用户：yhcguopdf

【摘要】

：

　　This study outlines the quantitation and characterization of element oxide nanoparticles(Al2O3,and CeO2)commonly used in the nanoelectronics and semiconduct

【作者】

：

Chady Stephan Leon Davidowski Charles Schneider

【机构】

：

PerkinElmer,Inc.,Shelton,CT,USA

【出处】

：

6th Asia-Pacific Winter Conference on Plasma Spectrochemistr

【发表日期】

：

2015年期

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　　This study outlines the quantitation and characterization of element oxide nanoparticles(Al2O3,and CeO2)commonly used in the nanoelectronics and semiconductor fabrication industry for the chemical-mechanical planarization(CMP)of semiconductor surfaces.

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The Characterization of Nanoparticles Element Oxide Slurries Used in Chemical-Mechanical Planarizati

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