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In the vacuum coating field,the co-sputtering method by tow or more targets has been widely used for coating the composite film consisted of a variety of component elements.In this paper,a typical co-sputtering system is studied which composes the twin round planar magnetron sputtering targets settled symmetrically and slantways towards a single flat substrate with self-rotation.A model is set up to describe the non-dimensional geometric relationship between the substrate and sputtering circles on two target surfaces.On the assumption that the sputtered particles are emitted in the direction of cosine distribution and fly straightly without collision scattering,the depositing rate distribution,film thickness distribution,the mean square deviation of film thickness,the usage of the target sputtering material,and the fluctuant ratio of the components from two targets are calculated.The macro-uniformity of film thickness at different places of the substrate and the micro-uniformity of the local components in the layer are investigated respectively.Some of simulating results are given.The structural and processing parameters of the co-sputtering system with two targets may be optimized for the component uniformity.