【摘 要】
：
Nanoimprint lithography(NIL)is considered as a promising technology for the next generation lithography owing to its low cost,high throughput and high resolution.Especially in Hard Disk Drive(HDD),LED
【机 构】
：
Xi'an jiaotong university(China)and Xi'an Technological University,China
【出 处】
：
2014年光子与光学工程国际会议暨西部光子学学术会议
论文部分内容阅读
Nanoimprint lithography(NIL)is considered as a promising technology for the next generation lithography owing to its low cost,high throughput and high resolution.Especially in Hard Disk Drive(HDD),LED,OLED,flexible display,optical and biological devices and so on,NIL has currently demonstrated great potential application prospects.The key feature for the NIL is a contact pattering process,so the parallel alignment between the two contact planes,namely the imprint template with predefined micro/nano patterns and the substrate,plays a more critical role in assuring the uniformity of the imprinted structures.The paper presents a novel compounding chromatic confocal parallel alignment sensor(CCPS)for NIL parallel alignment,which can simultaneously detect the space and the angle of inclination between the two contact planes.The sensor object principle plane and the substrate are co-planar.Unlike the common chromatic confocal displacement sensor(CCDS),the template reflection light with one certain wavelength is divided into two parts.One part of the light is accepted by a spectrometer,which is used to detect the space as a CCDS.At the same time,the other part light from the beam splitter prism propagates to the position sensitive detection(PSD)through an achromatic lens.Different response positions of the PSD,whose center is aligned and in the confocal axial,mean the different angle between the template and the substrate.Relying on the broadband light source and dispersive lens,the sensor obtains a chromatic displacement scope 1000μm.The displacement detection resolution of full scale output reaches to 50nm.The angle detection scope and resolution respectively are ? 癮nd ?.5″.After the parallel alignment,a NIL test is done in a 4 inch wafer.The nano hole structure in the five different area of the wafer is measured using scanning electron microscope(SEM).The structure uniformity proves the CCPS is effectively and high-precision.
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