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Nanoscale ridge apertures have been demonstrated to be applied for high resolution lithography.In this paper,we perform numerical study of nanoscale bowtie apertures with different outline dimensions and gap sizes to analyze its detailed field distribution for near-field scanning optical lithography(NSOL).It is found that the high imaging contrast,which is necessary for good quality lithography,is obtained in the near field region and decays quickly with the increasing distance.Furthermore,smaller gap size achieves higher imaging contrast and deeper depth of focus.We propose a unique manufacturing process to fabricate bowtie apertures with 12 nm gap size in chromium film and make static and dynamic experiments.