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LOWER THE CURING TEMPERATURE OF PHTHALONITRILE RESINS VIA LEWIS ACID-BASE COMPLEX CURING AGENTS
【机 构】
：
State Key Laboratory of Fine Chemicals,Dalian University of Technology,Dalian,P.R.China
【出 处】
：
第七届国际高分子化学学术研讨会
【发表日期】
：
2016年期
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