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  5. Numerical simulation of Silicon Waveguide Sidewall Smoothing by KrF Excimer Laser

Numerical simulation of Silicon Waveguide Sidewall Smoothing by KrF Excimer Laser

来源 :LIMIS 2016——The 4th International Symposium on Laser Interac | 被引量 : 0次 | 上传用户：ycl12345
【摘 要】
：
A two dimensional model is developed to simulate the process of profile transformation of sidewalls and roughness reduction on silicon waveguide during laser smoothing by KrF Excimer Laser.
【作 者】
：
Zewen Li Huibin Chen Zhidong zhang Shubin Yan Bing Han Xiaowu Ni 
【机 构】
：
Advanced Launching Co-innovation Center, Nanjing University of Science and Technology, Nanjing 21009
【出 处】
：
LIMIS 2016——The 4th International Symposium on Laser Interac
【发表日期】
：
2016年8期
【关键词】
：
Excimer laser sidewall roughness silicon waveguide smoothing FEM 
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　　A two dimensional model is developed to simulate the process of profile transformation of sidewalls and roughness reduction on silicon waveguide during laser smoothing by KrF Excimer Laser.
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