Deposition of Tetramethylsilane on the Glass by Plasma-Enhanced Chemical Vapor Deposition and Atmosp

来源 :The 8th Asian-European International Conference on Plasma Su | 被引量 : 0次 | 上传用户：guipian110

【作者】

：

Ko-Shao Chen Shu-Chuan Liao Shen-Wei Lin Norihiro Inagaki Hong-Ru Lin

【机构】

：

Department of Materials Engineering,Tatung University,Taipei,Taiwan

【出处】

：

The 8th Asian-European International Conference on Plasma Su

【发表日期】

：

2011年1期

【关键词】

：

Plasma Tetramethylsilane PECVD APPT

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Deposition of Tetramethylsilane on the Glass by Plasma-Enhanced Chemical Vapor Deposition and Atmosp

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