Self-Assembled Monolayers of Schiff base on the Surfaces of Oxidized Copper

来源 :Fifth International Conference on Surface Engineering(第五届表面工 | 被引量 : 0次 | 上传用户:linjinlong19880927
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  The Self-assembled monolayers (SAMs) of Schiff base had been formed on oxidized surfaces of copper.Schiff base used in this paper is N-2-hydroxyphenyl-(3-methoxy-salicylidenimine),designated V-bso.X-ray photoelectron spectroscopy (XPS),polarization curves,electrochemistry impedance spectroscopy (EIS) and the interface capacitance measurements have been employed to investigate the structure,formation and composition of these monolayers.For comparison,the monolayers also have been formed on clean copper.
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