Ni/SiO2 catalyst for CO methanation with support treated by dielectric barrier discharge plasma

• 作 者: ZHAOHualong[1]ZHAOBinran[1]YANXiaoliang[1]LIUYuan[2]
• 机 构: 1Advanced Nanotechnology Center, School of Chemical Engineering and Technology, Tianjin University,T
• 出 处: 等离子体催化与能源材料应用研讨会(ISPCEM2012)
• 发表日期: 2012年期

Ni/SiO2 catalyst was prepared using SiO2 which was treated by dielectric barrier discharge plasma before impregnation,and then evaluated by the CO methanation.Compared with the conventional Ni/SiO2 catalyst without support treatment,the CO and H2 conversion were both approximately 6 ％ higher for the support-treated catalyst at 400℃.After the high temperature reaction at 700℃ for 6 h,the support-treated catalyst was still more active.XRD results show that the support-treated catalyst has smaller Ni particle size.More Ni spieces were reduced at higher temperature on the support-treated catalyst during H2-TPR process,which indicates a stronger interaction between Ni and SiO2.It confirms that the plasma treatment makes SiO2 more favorable for Ni dispersion.