【摘 要】
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As semiconductor devices continue to shrink and become faster,new materials and processes be required to enable the continuation of this progress.Supercritical CO2 (SCCO2) based technology has been pr
【机 构】
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Department of Chemical and Biomolecular Engineering,Sogang University,Shinsu-Dong,Mapo-Gu,Seoul,Kore
【出 处】
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The 6th International Conference on Separation and Technolog
论文部分内容阅读
As semiconductor devices continue to shrink and become faster,new materials and processes be required to enable the continuation of this progress.Supercritical CO2 (SCCO2) based technology has been proposed for various steps in device fabrication,such as cleaning [1,2].Compared with conventional organic solvents CO2 is non-toxic,non-flammable,relatively inexpensive,and it has moderate critical constants (31.1 ℃ and,73.8 bar).Furthermore,SCCO2 has the solvating properties of a liquid and thus can dissolve chemicals,such as alcohols and amines,forming a homogenous supereritical fluid solution.SCCO2 is non-polar and has ability to solvate non-polar chemicals.However,it will not solvate many species,including inorganic salts and polar organic compounds that are usually necessary for efficient cleaning.Therefore co-solvents and/or chemical additives are added to the SCCO2 fluid to increase the solubility or enhance the dissociation of these species.We investigated the effect of surfactant concentration,and stripping temperature and pressure on the stripping efficiency.The wafer surfaces before and after stripping were analyzed by scanning electron microscopy and by an energy dispersive X-ray spectrometer.The HDIP could be stripped off completely in 30 rain with additive/SCCO2 mixture at 20MPa and 343 K.
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