A kind of sub-diffraction limit nanopillar struture array fabricating with visible CW laser

来源 :International Conference on Nanoscience & Technology,China 2 | 被引量 : 0次 | 上传用户:snowl
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  Nanopillar array is an indispensable functional structure for many scientific researches.In this paper, one kind of nanopillar structure array with the pillars diameter far smaller than Abbes diffraction limit is realized on negative tone photoresist film with our developed donut-shaped 532nm visible CW laser direct system, the average diameter of nanopillars is about 65nm and the smallest diameter is 48nm, which is about 1/11 of the incident laser wavelength.In addition, the main factors such as the coma and astigmatism effect are studied in detail with numerical simulation for achieving high-quality prospective nanoscale patterns.This preliminary work demonstrates a novel, easy and effective method of CW laser direct writing system for fabricating nanopillar/pore arrays with sub-diffraction dimensions.
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