【摘 要】
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AIXTRON has developed the AIX G5+,a new Planetary MOCVD platform to support the increasing demand for GaN-on-Silicon epitaxy on large wafers for both electr
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AIXTRON has developed the AIX G5+,a new Planetary MOCVD platform to support the increasing demand for GaN-on-Silicon epitaxy on large wafers for both electronic and optoelectronic applications.Following the same concept as existing Planetary Reactors,layer thickness can be tuned independently from the wafer temperature profile via carrier gas flow adjustment.In addition,the new Penta injector delivers the gas and metal organic material on 5 levels,enabling to adjust the layer thickness independently from the composition on large-area wafers.
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