The effect of NbN and ZrN films by magnetron sputtering on titanium and porcelain bonding

• 作 者: Shu-shu Wang Yang Xia La-bao Zhang Han-bing Guang Ming Shen Fei-min Zhang
• 机 构: Institute of Stomatology Nanjing Medical University,Nanjing,210029,China
• 出 处: 全球华人口腔医学大会暨2010中国国际口腔医学大会
• 发表日期: 2010年4期
• 关键词: Niobium nitride (NbN) Zirconium nitride (ZrN) Magnetron sputtering Titanium Porc

　　Niobium nitride (NbN) and Zirconium nitride (ZrN) were sputtered on titanium (Ti) substrates by Direct-current (DC) reactive magnetron sputtering,and worked as intermediate layers of a Ti-porcelain interface.The X-ray diffraction (XRD) results proved that both NbN and ZrN deposits were cubic crystalline phases.Bonding strength of the Ti-porcelain was designated Group Control (27.2 ± 0.75 MPa),Group NbN (43.1 ± 0.59 MPa),and Group ZrN (52.4 ± 0.80 MPa).Surface roughness was Group Control (1.863 ± 0.10 tμm),Group NbN (2.343 ± 0.07 μm),and Group ZrN (2.346 ± 0.10 μm).