Block Copolymer Healing of Lithographic Defects

来源 :Sixth International Symposium On Engineering Plastics (第六届工程 | 被引量 : 0次 | 上传用户：fxmen2

【摘要】

：

Extreme ultraviolet lithography (EUVL) is arguably the leading candidate to replace 193 nm immersion double pattering for the high volume manufacture of semiconductor devices at the 32 nm node and bel

【作者】

：

Han-Hao Cheng Imelda Keen Anguang Yu Ya-Mi Chuang Idriss Bla key Kevin S.Jack Michael J.Leeson Todd R.Younkin Andrew K.Whittaker

【机构】

：

Australian Institute for Bioengineering and Nanotechnology,The University of Queensland,St.Lucia,Que

【出处】

：

Sixth International Symposium On Engineering Plastics (第六届工程

【发表日期】

：

2013年11期

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Block Copolymer Healing of Lithographic Defects

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