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采用直流与射频磁控反应溅射法在硬质合金YG8衬底上制备了氮化碳(carbon nitride,CNx)薄膜。研究了溅射方式、衬底腐蚀处理对薄膜摩擦学性能的影响。结果表明:射频反应磁控溅射制备的CNx薄膜的膜基结合力和摩擦因数明显高于直流反应磁控溅射薄膜的,适当的负偏压可以提高膜基结合力。衬底化学腐蚀预处理能够大幅度提高CNx薄膜的膜基结合力,对直流溅射CNx薄膜的摩擦因数影响不大,但能降低射频溅射CNx薄膜的摩擦因数。射频反应磁控溅射法制备的CNx薄膜比直流溅射法制备的CNx薄膜耐磨性能好。衬底化学腐蚀预处理和溅射时对衬底施加适当的负偏压均有利于耐磨性能的提高。
A carbon nitride (CNx) thin film was deposited on the YG8 substrate by direct current and RF magnetron reactive sputtering. The effects of sputtering method and substrate etching on the tribological properties of the films were investigated. The results show that the film-based adhesion and friction coefficient of CNx films prepared by RF reactive magnetron sputtering are obviously higher than those of DC reactive magnetron sputtering films. Appropriate negative bias can improve the film-based adhesion. Substrate chemical etching pretreatment can greatly improve the film-based adhesion of CNx film, has little effect on the CNF film DC friction factor, but can reduce the CNF RF sputtering film friction factor. CNx films prepared by RF reactive magnetron sputtering have better wear resistance than CNx films prepared by DC sputtering. Substrate chemical etching pretreatment and sputtering substrate when applied to the appropriate negative bias are conducive to improving the wear resistance.