【摘 要】
：
受激辐射损耗超分辨成像中，利用两束激光同时作用荧光材料实现超分辨成像。其中一束激光用来激发材料发射荧光，另一束激光与第一束同轴，焦点被调制成一中心强度为零的环形光。环形光使处于激发态的电子弛豫回基态中较高的能级，并辐射出与材料荧光不同波长的光，实现荧光光斑尺寸的缩小。环形光的光强越强，产生的抑制作用越大，荧光分辨率越高。
【出 处】
：
2019激光材料、激光技术创新发展促融大会
论文部分内容阅读
受激辐射损耗超分辨成像中，利用两束激光同时作用荧光材料实现超分辨成像。其中一束激光用来激发材料发射荧光，另一束激光与第一束同轴，焦点被调制成一中心强度为零的环形光。环形光使处于激发态的电子弛豫回基态中较高的能级，并辐射出与材料荧光不同波长的光，实现荧光光斑尺寸的缩小。环形光的光强越强，产生的抑制作用越大，荧光分辨率越高。
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