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TiN thin films possess dual characteristics of metal and covalent structures that makes them useful in the environments where high degree of chemical inertness, temperature resistance, hardness, with additional good electrical and thermal conductivity is required [1, 2]. These properties make them a promising candidate to be used as hard coating for cutting tools, diffusion barrier for interconnects, wear resistant and bio compatible coatings for implants and prosthetic devices, and for superconducting devices [3]. TiN thin films can be grown in different orientations by controlling process variables and a preferred crystallographic orientation has a certain impact on physical properties.