【摘 要】
：
We prepared the vanadium oxide thin films on Si substrates by magnetron sputtering,using different substrate temperatures,The effects of substrate temperatu
【机 构】
：
ElectronicEngineeringInstituteChina
【出 处】
：
2016年第二届光子学与光学工程国际会议暨第八届西部光子学会议
论文部分内容阅读
We prepared the vanadium oxide thin films on Si substrates by magnetron sputtering,using different substrate temperatures,The effects of substrate temperature on film composition,micro morphology,resistance temperature characteristics,TCR(temperature coefficient of resistance)and other thin film characteristics were analyzed by XRD(X-Ray Diffraction),FESEM(Field emission scanning electron microscopy),and four-probe method.Results show that the increase of substrate temperature is conducive to the promotion of V2O5(101)crystal formation in the films,meanwhile it is beneficial to reduce the gap and improve the uniformity of grain size,so as to increase the density of the films.
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