【摘 要】
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This paper presents a review of Ti-Si-N-based nanocomposite films but the emphasis will be on the discussion of a novel Ti-Si-C-N system aiming at practical applications.Thin (1000 ℃) and excellent to
【机 构】
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Southwest Research Institute,6220 Culebra Road,San Antonio,Texas 78238-5166,USA
【出 处】
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Fifth International Conference on Surface Engineering(第五届表面工
论文部分内容阅读
This paper presents a review of Ti-Si-N-based nanocomposite films but the emphasis will be on the discussion of a novel Ti-Si-C-N system aiming at practical applications.Thin (<10 μm),Ti-Si-N-based nanocomposite films are being studied extensively due to their extraordinary hardness (40-100 GPa),high temperature oxidation resistance (>1000 ℃) and excellent toughness.These films were first prepared using chemical vapor deposition (CVD) and later using magnetron sputter deposition (MSD)-based physical vapor deposition (PVD).For practical applications,the deposition temperature for both technologies (>550 ℃) is still too high for most metals.In addition,in the present processes (both CVD and MSD) caustic,toxic and pyrophoric precursors such as SiH4,SiCl4 or TiCl4 are used,which hinders the industrial acceptance of the coatings.
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