7YSZ coating prepared by PS-PVD based on heterogeneous nucleation

• 作 者: X.F.Zhang K.S.Zhou M.Liu C.G.Deng C.M.Deng J.Mao Z.Q.Deng
• 机 构: National Engineering Laboratory for Modem Materials Surface Engineering Technology & The Key Lab of
• 出 处: 特种粉末冶金及复合材料制备/加工第一届学术会议
• 发表日期: 2016年12期
• 关键词: PS-PVD Disposition Mechanism

　　A Plasma spray-physical vapor deposition (PS-PVD) as a novel coating process based on low pressure plasma spray (LPPS) has been significantly used, where deposition takes place not only from liquid splats but also from nano-sized clusters and from the vapor phase in contrast to conventional technologies.As a consequence, thin, dense and porous ceramic coating for special application needs can be deposited through PS-PVD due to its high power, very low pressure, etc.This offers new opportunities to obtain different advanced microstructures and thus to meet the growing requirements in modern functional coatings.To better exploit the potential of such a gas phase deposition from PS-PVD, the deposition mechanisms and their dependency on process conditions must be understood detailedly.Therefore, coating experiments were performed at variant process conditions.Based on the observed phenomenon, a deposition mechanism of heterogeneous nucleation is presented.